Tetramethylammonium hydroxide CAS#:75-59-2

  • CAS Number: 75-59-2

  • Chemical Formula: C4H13NO

  • Appearance: Colorless Liquid

  • Synonyms:

    • N,N,N-TRIMETHYLMETHANAMINIUM HYDROXIDE

    • TETRAMETHYLAMMONIUM HYDROXIDE

    • TMAH

  • HS Code: 29239000

  • MOQ (Minimum Order Quantity): 1 FCL (Full Container Load)



Product Details

Products Description of Tetramethylammonium hydroxide CAS#:75-59-2

Tetramethylammonium hydroxide is a solid in the hydrated form or a colorless liquid with a strong ammonia-like odor. It is soluble in water, and corrosive to metals and tissue.

Tetramethylammonium hydroxide Chemical Properties
Melting point °C
Boiling point 110 °C
density 0.866 g/mL at 25 °C
vapor pressure 17.5 mm Hg ( 20 °C)
refractive index n20/D 1.384
Fp 80 °F
storage temp. Store below +30°C.
solubility Methanol (Sparingly), Water (Slightly)
form Solution
color APHA: ≤10
Odorstrong ammonia-like odor
PH>13 (H2O, 20°C)
Water Solubility Soluble in water.
Sensitive Air Sensitive
Merck 14,9224
BRN 3558708
Stability:Stable. Flammable. Incompatible with strong oxidizing agents, strong acids.
InChIKeyWGTYBPLFGIVFAS-UHFFFAOYSA-M
CAS DataBase Reference75-59-2(CAS DataBase Reference)
EPA Substance Registry SystemTetramethylammonium hydroxide (75-59-2)

Safety Information
Hazard Codes C,T,F,T+,Xn
Risk Statements 24/25-34-20/21/22-39/23/24/25-23/24/25-10-21/22-25-21-11-67-36-52-48/24-27/28-23-35-36/38
Safety Statements 45-36/37/39-26-16-36/37-28
RIDADR UN 3286 3/PG 2
WGK Germany 1
RTECS PA0875000
4.4-10-34
TSCA Yes
HazardClass 3
PackingGroup II
HS Code 29239000
Hazardous Substances Data75-59-2(Hazardous Substances Data)

Product Application of Tetramethylammonium hydroxide CAS#:75-59-2

Tetramethylammonium hydroxide is used to produce tetramethyl-ammonium azide. It is used as an anisotropic etchant of silicon, basic solvent in the development of acidic photoresist in photolithography process, as surfactant in the synthesis of ferrofluid and as a polarographic reagent. It finds application in the production of organic silicon, where it is used for computer silicon wafer surface brightener and cleaning agent. It is also involved in the purification of some metallic elements.
Tetramethylammonium hydroxide solution (25 wt.% solution in water) may be used as a base for pH adjustment to obtain hexagonal mesoporous aluminophosphate (TAP).

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